Multiaxis interferometric displacement measurement for local probe microscopy

Abstract

We present an overview of design approaches for nanometrology measuring setups with a focus on interferometry techniques and associated problems. The design and development of a positioning system with interferometric multiaxis monitoring and control is presented. The system is intended to operate as a national nanometrology standard combining local probe microscopy techniques and sample position control with traceability to the primary standard of length. © 2011 © Versita Warsaw and Springer-Verlag Wien.