Electrical characteristics of metal contacts to boron-doped diamond epitaxial film

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Abstract

Current-voltage characteristics have been obtained for various metal contacts formed on boron-doped diamond epitaxial film prepared on synthesized Ib diamond by the microwave plasma-assisted chemical vapor deposition method. Ti contacts and W contacts have exhibited good ohmic and Schottky properties, respectively. For the first time, we have fabricated Schottky diodes on boron-doped diamond epitaxial films using these contacts and investigated their properties. © 1989 The Japan Society of Applied Physics.

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APA

Shiomi, H., Nakahata, H., Imai, T., Nishibayashi, Y., & Fujimori, N. (1989). Electrical characteristics of metal contacts to boron-doped diamond epitaxial film. Japanese Journal of Applied Physics, 28(5R), 758–762. https://doi.org/10.1143/JJAP.28.758

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