Journal ArticleOPEN ACCESS

Total Dry Electron-Beam Vacuum Lithography System Using 4 Rotary Chambers

Shinku/Journal of the Vacuum Society of Japan (1986) 29(5) 424-428
DOI: 10.3131/jvsj.29.424
0Citations
Citations of this article
N/AReaders
Mendeley users who have this article in their library.

Cite

CITATION STYLE

APA

Uchida, Y., Kanie, T., Sago, M., Hori, M., Hattori, S., Matsui, K., … Nagamatsu, Y. (1986). Total Dry Electron-Beam Vacuum Lithography System Using 4 Rotary Chambers. Shinku/Journal of the Vacuum Society of Japan, 29(5), 424–428. https://doi.org/10.3131/jvsj.29.424

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free