Nanostructure formation of hypoeutectic silumin by electronion-plasma methods

Abstract

The structure, phase composition and defect substructure of the surface layers of hypoeutectic silumin after the complex processing including the electroexplosion ion plasma alloying by the yttrium oxide powder and the subsequent electron beam processing have been analyzed by the methods of modern physical material science. The complex processing is accompanied by the dissolution of the silicon inclusions and intermetallides and the formation of the submicro- and nanodimensional structure. The modified layer (70 μm) is multielemental and it has the structure of high velocity cellular crystallization.