Structural evolution of platinum thin films grown by atomic layer deposition

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Abstract

The structural properties of Pt films grown by atomic layer deposition (ALD) are investigated with synchrotron based x-ray scattering and x-ray diffraction techniques. Using grazing incidence small angle scattering, we measure the lateral growth rate of the Pt islands to be 1.0 Å/cycle. High resolution x-ray diffraction reveals that the in-plane strain of the Pt lattice undergoes a transition from compressive strain to tensile strain when the individual islands coalescence into a continuous film. This transition to tensile strain is attributed to the lateral expansion that occurs when neighboring islands merge to reduce their surface energy. Using 2D grazing incidence x-ray diffraction, we show that the lattice orientation becomes more (111) oriented during deposition, with a sharp transition occurring during coalescence. Pt ALD performed at a lower deposition temperature (250 °C) is shown to result in significantly more randomly oriented grains. © 2014 AIP Publishing LLC.

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Geyer, S. M., Methaapanon, R., Johnson, R., Brennan, S., Toney, M. F., Clemens, B., & Bent, S. (2014). Structural evolution of platinum thin films grown by atomic layer deposition. Journal of Applied Physics, 116(6). https://doi.org/10.1063/1.4892104

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