Abstract
Thin films of MoSi2 synthesized by solid state reaction of Mo/Si(111) structure were investigated by Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS) and electron energy-loss spectroscopy (EELS). In AES spectra of Si LVV of MoSi2 and Si(111), the peak shape changes have been assigned to silicide formation and the associated chemical bonding. XPS studies of Mo(3d), Mo(4p), and Si(2p) core level shows significant shifts due to silicide formation. Valence level spectrum of these films shows the dominating features of metal ‘‘d’’ bands. EELS studies show the distinct shifts in bulk plasmon, surface plasmon and interband transitions as a result of silicide formation. The shifts in EELS spectra of core level have been correlated with XPS results. Using the observed transitions in valence level and core level by EELS and XPS, an energy level diagram of MoSi2 has been proposed.
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CITATION STYLE
Rastogi, R. S., Vankar, V. D., & Chopra, K. L. (1992). Auger electron spectroscopy, x-ray photoelectron spectroscopy, and electron energy-loss spectroscopy studies of MoSi2. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 10(4), 2822–2825. https://doi.org/10.1116/1.577917
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