Low-pressure alcohol chemical vapor deposition of single-wall carbon nanotubes with in situ catalyst deposition

Abstract

A low-pressure chemical vapor deposition (CVD) system with in situ catalyst deposition capability has been fabricated to grow single-wall carbon nanotubes (SWNTs) in a controlled manner. To clarify the unique of the low-pressure CVD technique, the effect of Ar gas introduction while heating the sample up to the growth temperature and the effect of the "in situ deposition" of the catalyst metal on the yield of SWNTs have been investigated. It has been found that the highest yield of SWNTs is obtained when the "in situ deposition" and "without-Ar" conditions are used. © 2008 The Japan Society of Applied Physics.