A novel method to test and optimize the periphery crosstalk in CMOS image sensor

Abstract

For the purpose of reducing the peripheral crosstalk occur in the edge pixel, we illustrated a method to test and quantify the intensity of this crosstalk, and setup a model combining the opposite incident light and color construction. With the aid of the method and model, we conducted many experiments to analyze and compare the improvement measures, finding that the increase of pixel edge to package edge distance, sealing glass thinning and black photoresist coating around edge are all effective to reduce the peripheral crosstalk. Moreover, considering the effect and cost, the sealing glass thinning is the relatively best measure.