Evidence of 2D-3D transition during the first stages of GaN growth on AlN

4Citations
Citations of this article
9Readers
Mendeley users who have this article in their library.

This article is free to access.

Abstract

In order to identify the strain relaxation mechanism, Molecular Beam Epitaxy of wurtzite GaN on AlN was monitored in situ using Reflection High Energy Electron Diffraction (RHEED). In the substrate temperature range between 620°C and 720°C, a Stransky-Krastanov (SK) transition was evidenced, resulting in a 2D-3D transition after completion of 2 monolayers, with subsequent coalescence of 3D islands, eventually resulting in a smooth surface. Quantitative analysis of the RHEED pattern allowed us to determine that island formation is associated with elastic relaxation. After island coalescence, a progressive plastic relaxation is observed. The size and density of 3D islands was varied as a function of the growth parameters. AFM experiments revealed that the size of the GaN islands, about 8 nm large and 2 nm high, was small enough to expect quantum effects. It was found that capping of the islands by AlN resulted in a smooth surface after depositioln of a few monolayers allowing us to grow a «superlattice» of islands by periodically repeating the process.

Cite

CITATION STYLE

APA

Widmann, F., Daudin, B., Feuillet, G., Samson, Y., Arlery, M., & Rouviere, J. L. (1997). Evidence of 2D-3D transition during the first stages of GaN growth on AlN. MRS Internet Journal of Nitride Semiconductor Research, 2. https://doi.org/10.1557/s1092578300001460

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free