Study on Properties of TiSi/C, TiSiN/C and TiSiO/C Multilayer Thin Films Prepared by High-Power Pulsed Magnetron Sputtering

Abstract

This paper studies the effect of nitrogen or oxygen on the properties of TiSi/C hard films. Three sets of nano-multilayer composite hard films TiSi/C, TiSiN/C and TiSiO/C were prepared on tungsten carbide, 304 stainless steel and Si wafer substrates by high-power pulsed magnetron sputtering and DC magnetron sputtering. Meanwhile, X-ray diffraction (XRD), field emission-scanning electron microscope (SEM), Vickers hardness tester, tungsten carbide ball friction test, Raman spectra and electrochemical corrosion tests were performed to investigate the effects of nitrogen or oxygen on the microstructure, mechanical properties, tribology and corrosion resistance of TiSi/C films. The results show that the hardness of TiSiN/C film is 27.7% higher than that of TiSi/C film, and the hardness of TiSiO/C film is 67% higher than that of TiSi/C film. Besides, the hardness of the TiSiO/C film reaches 3771 HV, the friction coefficient is only 0.25, and the corrosion resistance is also the most excellent.