High power light source for future extreme ultraviolet lithography based on energy-recovery linac free-electron laser

Abstract

The development of ways to increase the intensity of extreme ultraviolet (EUV) light sources for future EUV lithography is important to realize high throughput fine patterning. The energy-recovery linac (ERL) free-electron laser (FEL), which is an accelerator based light source, is a candidate for this. We clarify the design concept of the ERL-FEL for EUV light sources for future lithography, delivery systems of the FEL light to multiscanners, and future development items of the accelerator technologies and a possibility of the beyond EUV.