Birefringence enhancement in annealed Ti O2 thin films

Abstract

Postdeposition thermal annealing is used to enhance the form birefringence of nanostructured Ti O2 thin films grown by electron-beam evaporation using the serial bideposition technique. Thin films were grown on fused silica substrates using oblique deposition angles between 60° and 75° and repetitive 180° substrate rotations to produce birefringent thin films that are structurally anisotropic. Postdeposition annealing in air, between 200 and 900 °C, was used to increase the form birefringence of the films by changing the Ti O2 phase from the as-deposited amorphous state to a polycrystalline state that exhibits a greater inherent density and larger bulk refractive index. The optical properties, microstructure, and crystallinity were characterized by Mueller matrix ellipsometry, scanning electron microscopy, atomic force microscopy, and x-ray diffraction. It was found that the in-plane birefringence increased significantly upon thermal annealing, in some cases yielding birefringence values that doubled in magnitude, from 0.11 to 0.22 at a wavelength of 550 nm for films annealed at 400 °C. © 2007 American Institute of Physics.