Abstract
The microstructure of optically optimized transparent AlN/SiO 2 nano multilayers were investigated and compared with baseline repeated bilayer configurations. The multilayered films were synthesized by magnetron sputtering and characterized by transmission electron microscopy and spectrophotometry with multifunctional behavior evaluated by nanoindentation and residual stress analysis. The optically optimized AlN/SiO 2 multilayers exhibit higher transmittance (%T 300-800nm ≈95%), distinct crystalline/amorphous interfaces, and changes in the grain morphology as compared to the periodic baseline samples (%T 300-800nm ≈70-80%). Varying both layer thickness and layer ratio to maximize transparency showed a significant impact on microstructure and interface character.
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CITATION STYLE
Appleget, C. D., & Hodge, A. M. (2020). Exploring microstructural variations in highly transparent AlN/SiO 2 nano multilayers. Optical Materials Express, 10(4), 850. https://doi.org/10.1364/ome.389156
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