Shape control in wafer-based aperiodic 3D nanostructures

16Citations
Citations of this article
33Readers
Mendeley users who have this article in their library.

Abstract

Controlled local fabrication of three-dimensional (3D) nanostructures is important to explore and enhance the function of single nanodevices, but is experimentally challenging. We present a scheme based on e-beam lithography (EBL) written seeds, and glancing angle deposition (GLAD) grown structures to create nanoscale objects with defined shapes but in aperiodic arrangements. By using a continuous sacrificial corral surrounding the features of interest we grow isolated 3D nanostructures that have complex cross-sections and sidewall morphology that are surrounded by zones of clean substrate. © 2014 IOP Publishing Ltd.

Cite

CITATION STYLE

APA

Jeong, H. H., Mark, A. G., Gibbs, J. G., Reindl, T., Waizmann, U., Weis, J., & Fischer, P. (2014). Shape control in wafer-based aperiodic 3D nanostructures. Nanotechnology, 25(23). https://doi.org/10.1088/0957-4484/25/23/235302

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free