Abstract
This letter presents a novel high density differential split gate flash memory with self-boosting function realized by 0.18-μ m embedded memory technology from Taiwan Semiconductor Manufacturing Company. The cell has a pair of symmetric floating gates to perform differential read for storage electrons in the dual gate. Besides, a simple and nondecoding self-boosting operation is built in to automatically boost threshold levels of the symmetric cells to prevent a long-term charge loss or data degradation problem. Since the cell process and tip erase structure are totally inherited from the proven split-gate flash technology, the highly efficient program and erase performances are remained in the new cell. This implemented self-boosting operation provides a promising solution for reliable embedded memory for advanced CMOS technology. © 1980-2012 IEEE.
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Shen, W. C., Lee, T. L., Pan, H. W., Yang, Z. S., Chih, Y. D., Lien, C. W., … Lin, C. J. (2013). New high-density differential split gate flash memory with self-boosting function. IEEE Electron Device Letters, 34(9), 1127–1129. https://doi.org/10.1109/LED.2013.2271498
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