Abstract
Poly(3,4-ethylenedioxythiophene) (PEDOT) and chitosan structures on Si, patterned by plasticizer-assisted imprint lithography (PAIL), are examined under a variety of imprinting conditions. The stabilities of pattern dimension and chemical functionality of these polymers are presented. Thermal annealing for 5min at 80°C is found to be an effective method to stabilize imprinted PEDOT patterns. Biofunctionality in chitosan as a function of imprint temperature and pressure is examined through fluorescence spectroscopy. The accessibility of the amine group of chitosan is observed to decrease for imprint temperatures above 80°C, whereas the chemical functionality is not affected by pressure up to 1MPa. Fluorescence spectra of the chitosan are observed to be strong functions of exposure time to O2 plasma.
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CITATION STYLE
Reano, R. M., Kong, Y. P., Low, H. Y., Tan, L., Wang, F., Pang, S. W., & Yee, A. F. (2004). Stability of functional polymers after plasticizer-assisted imprint lithography. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 22(6), 3294–3299. https://doi.org/10.1116/1.1825013
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