Optoelectronic surface-related properties in boron-doped and irradiated diamond thin films

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Abstract

Elucidation of microscopic properties of synthetic diamond films, such as formation and evolution of bulk and surface defects, chemistry of dopants, is necessary for a reliable quality control and reproducibility in applications. Surface photovoltage (SPV) spectroscopy and photoluminescence (PL) spectroscopy were employed to study diamond thin films grown on silicon by microwave plasma-assisted chemical vapor deposition and hot-filament chemical vapor deposition with different levels of boron doping in conjunction with gamma irradiation. SPV experiments showed that while the increase of boron concentration leads to a semiconductor-metal transition, subsequent gamma irradiation reverts quasi-metallic samples back to a semiconducting state by compensating electrical activity of boron possibly via hydrogen. One of the most pronounced common transitions observed at ∼3.1-3.2 eV in the SPV spectra was also present in all of the PL spectra. It is likely that this is a signature of the sp2-hybridized carbon clusters in or in the vicinity of grain boundaries. © 2012 American Institute of Physics.

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Nemashkalo, A., Chapagain, P. R., Peters, R. M., Farmer, J., Gupta, S., & Strzhemechny, Y. M. (2012). Optoelectronic surface-related properties in boron-doped and irradiated diamond thin films. Journal of Applied Physics, 111(2). https://doi.org/10.1063/1.3678004

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