Pseudocapacitive Characteristics of Vanadium Oxide Deposits with a Three-Dimensional Porous Structure

  • Huang C
  • Hu C
  • Chang K
  • et al.
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Abstract

A three-dimensional porous vanadium oxide was anodically deposited onto graphite substrates (denoted as VOxn H2O/G) at 0.7 V from an aqueous solution containing 25 mM VOSO4 and 5 mM H 2O2. Through annealing at temperatures up to 350°C, the thermal stability of VOx n H2O preserved its porous morphology and excellent capacitive performances in 3 M KCl (pH 2.4). X-ray photoelectron spectroscopic analysis revealed the mixed valence nature of oxy-/hydroxyl-vanadium species in which the amount of V4+ species was not significantly affected by varying the annealing temperature. A maximal specific capacitance of ca. 150-160 F g-1 measured at 250 mV s-1 was obtained for this porous VOx n H2O annealed between 150 and 250°C. Only 9-17% loss in specific capacitance was found for these VOx n H 2O when the scan rate of the cyclic voltammetry was increased from 25 to 250 mV s-1, demonstrating a typical high power property, which was never found in the VOx n H2O -based supercapacitors. © 2009 The Electrochemical Society.

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APA

Huang, C.-M., Hu, C.-C., Chang, K.-H., Li, J.-M., & Li, Y.-F. (2009). Pseudocapacitive Characteristics of Vanadium Oxide Deposits with a Three-Dimensional Porous Structure. Journal of The Electrochemical Society, 156(8), A667. https://doi.org/10.1149/1.3138703

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