Conference Proceedings

MULTI-LAYER RESIST SYSTEMS AS A MEANS TO SUBMICRON OPTICAL LITHOGRAPHY.

Technical Digest - International Electron Devices Meeting (1982) 391-394
DOI: 10.1109/iedm.1982.190306
7Citations
Citations of this article
10Readers
Mendeley users who have this article in their library.
Get full text

Cite

CITATION STYLE

APA

Lin, B. J. (1982). MULTI-LAYER RESIST SYSTEMS AS A MEANS TO SUBMICRON OPTICAL LITHOGRAPHY. In Technical Digest - International Electron Devices Meeting (pp. 391–394). IEEE. https://doi.org/10.1109/iedm.1982.190306

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free