Abstract
Photoconductivity in silicon hyperdoped with sulfur and selenium above the insulator-to-metal transition was measured via photoinduced changes in the microwave reflectivity of hyperdoped layers formed on p-type silicon. Despite these materials' strong subgap optical absorption, exposing them to 1310 and 1550nm light results in a change in conductivity per photon 10,000 times smaller than what is observed in untreated silicon exposed to 980nm light. A similar bound applies for 405nm light, which is absorbed entirely in the hyperdoped layer. We use these results to deduce that the photocarrier lifetime in the hyperdoped material is ≤100 ns. © 2012 The Japan Society of Applied Physics.
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CITATION STYLE
Recht, D., Hutchinson, D., Cruson, T., DiFranzo, A., McAllister, A., Said, A. J., … Aziz, M. J. (2012). Contactless microwave measurements of photoconductivity in silicon hyperdoped with chalcogens. Applied Physics Express, 5(4). https://doi.org/10.1143/APEX.5.041301
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