Abstract
Postdeposition chemical etching of spectral-hole filters, which were fabricated as chiral sculptured thin films with central 90-deg-twist defects, decreases the cross-sectional dimensions of the helical columns that such films comprise and blueshifts the spectral holes, thereby establishing the efficacy of postdeposition chemical etching as a means to tune the optical response characteristics of sculptured thin films. © 2007 Society of Photo-Optical Instrumentation Engineers.
Cite
CITATION STYLE
Pursel, S. M. (2007). Tuning of sculptured-thin-film spectral-hole filters by postdeposition etching. Optical Engineering, 46(4), 040507. https://doi.org/10.1117/1.2721543
Register to see more suggestions
Mendeley helps you to discover research relevant for your work.