Structure of mixed-phase Si films studied by C-AFM and X-TEM

Abstract

Thin Si films prepared by plasma enhanced chemical vapor deposition at low temperature and containing microcrystalline grains in amorphous tissue were studied by two complementary microscopy techniques. The conductive atomic force microscopy was performed in standard ambient conditions, whereas the presence of the surface oxide was overcome by more sensitive (pA) current detection. The cross-sectional transmission electron microscopy images of the amorphous phase revealed the columnar structure, which was successfully correlated with the bumpy surface detected by the atomic force microscope. © 2007 IOP Publishing Ltd.