Low-angle X-ray spectroscopy and reflectometry techniques in interdisciplinary applications

Abstract

In this paper, the low-angle X-ray spectroscopy and reflectometry techniques, namely: the total reflection X-ray fluorescence analysis, grazing emission X-ray fluorescence analysis, grazing incidence X-ray fluorescence analysis, X-ray reflectometry and total reflection X-ray photoelectron spectroscopy, are presented. These techniques are used in the scientific activity, in interdisciplinary applications, at the Institute of Physics of the Jan Kochanowski University in Kielce (UJK) and the Department of Physical Methods of the Holy Cross Cancer Center (SCO). The studies were conducted in international cooperation with the European Synchrotron Radiation Facility (ESRF, Grenoble, France), the University of Fribourg (Switzerland) and Elettra Sincrotrone Trieste (Elettra, Trieste, Italy). The physical basics of the techniques are discussed as well as experimental setups applying either X-ray tube radiation or synchrotron radiation. Examples of the study possibilities and interdisciplinary applications, presented in the article, include elemental content analysis in human biological materials, biological and environmental samples (total reflection X-ray fluorescence analysis) and depth profiling of silicon wafer impurities (grazing emission X-ray fluorescence analysis). The paper also presents depth profiling, morphology study and surface elemental and chemical composition analysis of titanium and titanium dioxides nanolayers deposited on different substrates and irradiated by Xe ions in high charge states (grazing incidence X-ray fluorescence analysis, X-ray reflectometry, total reflection X-ray photoelectron spectroscopy).