Abstract
A 2-nm thick Nb 2O 5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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Hisatomi, T., Dotan, H., Stefik, M., Sivula, K., Rothschild, A., Grätzel, M., & Mathews, N. (2012). Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer. Advanced Materials, 24(20), 2699–2702. https://doi.org/10.1002/adma.201104868
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