Integration of complementary circuits and two-dimensional electron gas in a Si/SiGe heterostructure

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Abstract

We have realized complementary devices on an undoped Si/SiGe substrate where both two-dimensional electrons and holes can be induced capacitively. The design of the heterostructure and the fabrication process are reported. Magnetotransport measurements show that the induced two-dimensional electron gas exhibits the quantum Hall effect characteristics. A p-channel field-effect transistor is characterized and the operation of an inverter is demonstrated. The proof-of-principle experiment shows the feasibility of integrating complementary logic circuits with quantum devices. © 2010 American Institute of Physics.

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Lu, T. M., Lee, C. H., Tsui, D. C., & Liu, C. W. (2010). Integration of complementary circuits and two-dimensional electron gas in a Si/SiGe heterostructure. Applied Physics Letters, 96(25). https://doi.org/10.1063/1.3456375

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