Strain Engineering to Release Trapped Hole Carriers in p-Type Haeckelite GaN

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Abstract

The gallium nitride haeckelite (4|8-GaN) phase is an attractive material for a two-dimensional (2D) light-emitting diode (LED); however, its p-type doping is still challenging due to hole carrier trapping. Our density functional theory calculations suggest strain engineering as a route to release trapped hole carriers. We show that Mg and Be impurities in 4|8-GaN have multifarious hole states, including symmetry-broken polaronic (trapped) and delocalized (extended) states, whose detrapping energies are estimated to be 33.4 and 263.3 meV for Mg and Be impurities, respectively. The hole states trapped by a Mg impurity can be, however, detrapped by applying a moderate tensile strain around 2% perpendicular to the 4|8 plane, which would critically enhance p-type dopability. We further show that the photoluminescence (PL) spectrum of a Mg impurity can be tuned by the lattice strain, which enables efficient control for light emission of 4|8-GaN. Our findings pave the way to design an atomically thin blue LED based on 4|8-GaN.

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APA

Bae, S., Kang, Y. G., Ichihashi, K., Khazaei, M., Swamy, V., Han, M. J., … Raebiger, H. (2021). Strain Engineering to Release Trapped Hole Carriers in p-Type Haeckelite GaN. ACS Applied Electronic Materials, 3(12), 5257–5264. https://doi.org/10.1021/acsaelm.1c00765

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