Study on polymer and process design in thermal nanoimprint lithography

Abstract

Rapid process is one of the most important issues for industrial usages in thermal Nanoimprint Lithography (NIL). Detail study on the polymer deformation process time is indispensable to design process conditions and resist polymer characteristics. We experimentally study the dependence of the process time on the resist properties and predict required process time for various molecular weights in Poly- Methyl Methacrylate (PMMA). The time evaluation of the resist profile for various molecular weights (Mw) is observed and obtained the deformation process time in experimentally. According to the measurement of viscosity of polymers and experimental results, the relation between the viscosity and the process time is investigated for various molecular weight of PMMA. The results indicate that the deformation process time T[s] is fairly proportional to the viscosity of the polymer. From this relation, the required process time is predicted in various process temperatures and molecular weights in PMMA. © 2008 CPST.