Chemical vapor deposition growth of broadband tunable light absorption and anti-reflection properties of VS2 nanostructure films

10Citations
Citations of this article
12Readers
Mendeley users who have this article in their library.
Get full text

Abstract

A facile chemical vapor deposition method to prepare VS2 with different nano-micro structures for the high absorption of long wavelength is reported. It is demonstrated in this research that the VS2 with nanowire-like structure can enable absorbing >92% across the wavelengths from 400 nm to 2.5 μm and above 94.5% for the mid-infrared regime (2.5 μm–10 μm), demonstrating it a very high and efficient absorber reported to date. The improved anti-reflection and pronounced light absorption properties make the black absorber an ideal material in applications such as biomedical and electro-optical devices for the military purposes.

Cite

CITATION STYLE

APA

Dong, H., Duan, A., Zhong, S., Zhang, Y., & Zhou, X. (2019). Chemical vapor deposition growth of broadband tunable light absorption and anti-reflection properties of VS2 nanostructure films. Materials Letters, 252, 227–230. https://doi.org/10.1016/j.matlet.2019.06.002

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free