Electron temperature characterization of H2 processing plasma by optical emission spectroscopy

Abstract

Optical emission spectroscopy of hydrogen (H2) plasma is performed to characterize the electron temperature, T e. The H2 Fulcher band emission and radiative dissociation continuum are measured, where the Fulcher band emission is recognized to be T e-sensitive, compared with the dissociation continuum. With this T e-sensitive nature, a simple way of determining T e is proposed, specifically using the intensity ratio of the Fulcher band emission to dissociation continuum. The T e determination is demonstrated for H2 processing plasmas generated by capacitively coupled discharges at different gas pressures.