Ordered 2D Structure Formed upon the Molecular Beam Epitaxy Growth of Ge on the Silicene/Ag(111) Surface

Abstract

Growth of Ge by molecular beam epitaxy (MBE) on top of the silicene monolayer on the Ag(111) surface results in either a dispersed adlayer or a two-dimensional (2D) ordered structure depending on the silicene phase. Scanning tunneling microscopy (STM) images show that the ordered adsorbed Ge atoms on (3 × 3)Si domains occupy a position directly on top of down atoms in the buckled silicene layer, similar to the adatom positions on the Ge(111)-c(2 × 8) surface. By contrast, no long-range ordering of Ge adatoms is observed on the (7×7)SiR19.1° domain, possibly partly because of the interference effects of the Ag substrate. Results herein suggest that the deposited Ge atoms tend to build an additional three-dimensional bulk layer on the silicene monolayer and that the growth of the 2D germanene/silicene heterostructure may not be achieved in a straightforward manner.