Nano- and Microstructuring of SiO2 and Sapphire with Fs-laser Induced Selective Etching

  • Hörstmann-Jungemann M
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Abstract

Sub wavelength ripples perpendicular to the polarisation of the laserradiation are obtained by scanning a tightly focused beam (similarto 1 mu m) of femtosecond laser radiation over the surface and throughthe volume of various materials. The ripple patterns extend coherentlyover many overlapping laser pulses and scanning tracks. The cross-sectionsand the surface of the ripples and in volume nanoplanes are investigatedusing electron microscopy. By using microscope objectives with higherNumerical Apertures micro-channels can be fabricated with a techniquecalled In Volume Selective Laser Etching (ISLE).

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Hörstmann-Jungemann, M. (2009). Nano- and Microstructuring of SiO2 and Sapphire with Fs-laser Induced Selective Etching. Journal of Laser Micro/Nanoengineering, 4(2), 135–140. https://doi.org/10.2961/jlmn.2009.02.0011

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