Ultrahigh Dielectric Permittivity of a Micron-Sized Hf0.5Zr0.5O2 Thin-Film Capacitor After Missing of a Mixed Tetragonal Phase

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Abstract

Ferroelectric-to-nonferroelectric transition occurs in a micron-sized Hf0.5Zr0.5O2 thin-film capacitor with the generation of a giant dielectric permittivity. Synchrotron X-ray micro-diffraction patterns show missing of a mixed tetragonal phase in the capacitor. The stored charge density of the capacitor is as high as 183 μC cm-2 at an operating voltage/time of 1.2 V/50 ns at cycle numbers of more than 1012 without inducing dielectric breakdown.

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Di Zhang, W., Li, B., Wang, W. W., Wang, X. Y., Cheng, Y., & Jiang, A. Q. (2026). Ultrahigh Dielectric Permittivity of a Micron-Sized Hf0.5Zr0.5O2 Thin-Film Capacitor After Missing of a Mixed Tetragonal Phase. Nano-Micro Letters, 18(1). https://doi.org/10.1007/s40820-025-01841-x

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