Photosensitive polyesterimides based on reaction development patterning

Abstract

Various soluble polyesterimides with ketone or sulfone group in main chain were prepared by a direct one-pot polycondensation of the corresponding dianhydrides and diamines in the presence of γ-valerolactone/pyridine catalyst. The polyesterimide films containing the photosensitive agent, diazonaphthoquinone compound PC-5®, gave positive patterns based on reaction development patterning (RDP) by UV irradiation and the following development with ethanolamine/NMP/H2O mixture. The relationship between the main chain structure and photosensitivity such as shape of the resulting patterns and development time was examined, and the development time dramatically decreased by marginal introduction of electron-withdrawing group in the polymer and then gradually decreased with increasing its content. The scanning electron microscopic photograph showed that the shape of the resultant patterns depended on the polymer structure. © 2006 The Society of Polymer Science, Japan.