Abstract
Zinc oxide films prepared by the recently developed ion layer gas reaction (ILGAR) technique and by rf magnetron sputtering are compared with respect to their linear optical properties. Spectral ellipsometry as well as reflectance and transmittance measurements in the UV-visible-near infrared range were employed to deduce the complex refractive index. The band gap energy, Urbach energy, and packing density were determined. The results are compared to literature data of single crystals and thin films. © 2002 American Institute of Physics.
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CITATION STYLE
Rebien, M., Henrion, W., Bär, M., & Fischer, C. H. (2002). Optical properties of ZnO thin films: Ion layer gas reaction compared to sputter deposition. Applied Physics Letters, 80(19), 3518–3520. https://doi.org/10.1063/1.1479211
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