Abstract
Femtosecond laser-induced ripple structures were fabricated on semiconductor materials such as silicon and silicon carbide. While a coarse ripple was observed on both materials under the proper irradiation conditions, a fine ripple was observed only on the silicon carbide. The cross-sectional profile of ripple structure was examined by scanning electron microscopy with sliced or tilted sam-ples. Based on the experimental observations, the formation mechanism of the ripple structure was discussed.
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Tomita, T., Kinoshita, K., Murai, T., Fukumori, Y., Matsuo, S., & Hashimoto, S. (2007). Femtosecond laser-induced ripple structures in semiconductor materials. Journal of Laser Micro Nanoengineering, 2(2), 141–145. https://doi.org/10.2961/jlmn.2007.02.0007
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