Process study of copper preparation by FDM-assisted limited domain electrodeposition

Abstract

A combination of Fused Deposition Modeling (FDM) and electrochemical deposition was used to prepare copper samples, and the influence of different copper anodes on the composition and microstructure of the prepared samples were investigated. It was shown that under the deposition conditions of constant current, the deposited products were mainly copper with trace impurity elements when brass, leaded brass, phosphor bronze, manganese copper, purple copper, and beryllium copper were used as anodes. The surface morphology of copper films obtained when brass was used as an anode was the flattest, and the thickness was also the largest. Electrodeposition experiments of 20 and 150 layers of copper samples were conducted using brass as the anode and the preliminary validation of FDM-assisted electrochemical additive manufacturing fabricating 3D solids.