Auger electron spectroscopy/x-ray photoelectron spectroscopy study of Ti–B–N thin films

Abstract

Ti–B–N layers have been produced by sputter deposition from a BN target onto which small Ti platelets have been positioned. The Ti–B–N composition has been varied and the films studied by Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS). Quantified chemical state information from the XPS B 1s and N 1s peaks give a thin film phase composition consistent with that predicted from the bulk phase diagram. A method of film composition quantification by AES is proposed, accounting for the Ti L3M2,3M2,3 and N KL2,3L2,3 peak overlap problem. Ti L3M2,3M4,5 peak shape changes have been examined using factor analysis, showing the presence of phases and phase changes in qualitative agreement with the phase diagram. Correlations of the compositional and mechanical testing data show that films of highest hardness are obtained when a composition of approximately TiBN0.5 is obtained, the phase composition being a combination of TiB2 and TiN.