High-precision in-situ size measurements of single microparticles in an RF plasma

Abstract

An in-situ method to measure the radii of single microparticles in plasmas with high precision is presented. The particles are trapped in the plasma sheath and illuminated with laser light. Using out-of-focus imaging and polarizing optics, the angle- A nd polarization-resolved scattering intensities are measured and compared to Lorenz-Mie theory. A two-stage fit procedure is introduced to obtain the complex refractive index in addition to the particle radius. Complementary long-distance microscopy measurements are performed to compare with fit results. The method is applied to particles of different materials used in complex plasma research to measure etch rates due to plasma inherent processes.