Modeling of a micromagnetic imprinting process

Abstract

In this article, we present the magnetic modeling of a batch-fabrication process to imprint microscale pole patterns in hard-magnetic thick films. The imprinting process enables the creation of complex magnetic field patterns from permanent magnetic layers. The selective magnetic imprinting and the resultant stray fields are modeled in a two-step process using COMSOL Multiphysics in conjunction with measured magnetic hysteresis behavior. The models are used to evaluate the process design space and to predict the resulting stray magnetic field distribution in a patterned, 10-µm-thick Co-Pt magnetic film.