Influence of polarity and hydroxyl termination on the band bending at ZnO surfaces

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Abstract

Surface sensitive synchrotron x-ray photoelectron spectroscopy (XPS) and real-time in situ XPS were used to study the thermal stability of the hydroxyl termination and downward band bending on the polar surfaces of ZnO single crystals. On the O-polar face, the position of the Fermi level could be reversibly cycled between the conduction band and the band gap over an energetic distance of approximately 0.8 eV (∼1/4 of the band gap) by controlling the surface H coverage using simple ultrahigh vacuum (UHV) heat treatments up to 750 C, dosing with H2O/H2 and atmospheric exposure. A metallic to semiconductorlike transition in the electronic nature of the O-polar face was observed at an H coverage of approximately 0.9 monolayers. For H coverage less than this, semiconducting (depleted) O-polar surfaces were created that were reasonably stable in UHV conditions. In contrast, the downward band bending on the Zn-polar face was significantly more resilient, and depleted surfaces could not be prepared by heat treatment alone. © 2013 American Physical Society.

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Heinhold, R., Williams, G. T., Cooil, S. P., Evans, D. A., & Allen, M. W. (2013). Influence of polarity and hydroxyl termination on the band bending at ZnO surfaces. Physical Review B - Condensed Matter and Materials Physics, 88(23). https://doi.org/10.1103/PhysRevB.88.235315

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