Abstract
We propose a spin-on glass (SOG) film densification technique based on the plasma-treatment technology. We demonstrated the densification of the SOG film at the temperature of lower than 53 degree C without compulsory cooling. We investigate the plasma-densification condition and found that the optimum RF power needed to densify the SOG film. This technique is applicable for production processes in wide range of electronic devices. © 2011 Ceramic Society of Japan.
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CITATION STYLE
Yoshida, T., Nagao, M., Ohsaki, H., Shimizu, T., & Kanemaru, S. (2011). Densification of spin-on-glass (SOG) film by RF plasma treatment. In IOP Conference Series: Materials Science and Engineering (Vol. 18). Institute of Physics Publishing. https://doi.org/10.1088/1757-899X/18/3/032007
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