Abstract
We combine the extended finite element method with simulations of diffracted x-ray intensities to investigate the diffusely scattered intensity due to dislocations. As a model system a thin PbSe epitaxial layer grown on top of a PbTe buffer on a CdTe substrate was chosen. The PbSe film shows a periodic dislocation network where the dislocations run along the orthogonal 〈 110 〉 directions. The array of dislocations within this layer can be described by a short range order model with a narrow distribution. © 2010 American Institute of Physics.
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CITATION STYLE
Wintersberger, E., Hrauda, N., Kriegner, D., Keplinger, M., Springholz, G., Stangl, J., … Seeck, O. H. (2010). Analysis of periodic dislocation networks using x-ray diffraction and extended finite element modeling. Applied Physics Letters, 96(13). https://doi.org/10.1063/1.3379298
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