Abstract
Electrically stressed Bi-Sb-Te thin films have demonstrated markedly enhanced Hall mobility and moderately reduced carrier concentration. To lower electrical resistivity further, a Sb-inserted Bi-Sb-Te multilayer structure was prepared through consecutively sputtering Bi-Sb-Te and Sb layers followed by electric current stressing. The electrically stressed Sb/Bi-Sb-Te film demonstrates high carrier concentration and enhanced Hall mobility. We propose that the additional Sb supply suppresses electromigration-induced Sb depletion in crystal lattices, thus maintains high carrier concentration of the Bi-Sb-Te film. The presented approach provides a simple means to optimize thermoelectric properties of Bi-Sb-Te films. © 2010 American Institute of Physics.
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CITATION STYLE
Liao, C. N., Chang, C. Y., & Chu, H. S. (2010). Thermoelectric properties of electrically stressed Sb/Bi-Sb-Te multilayered films. In Journal of Applied Physics (Vol. 107). https://doi.org/10.1063/1.3326878
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