Characterization of laser ablated silicon thin films

Abstract

Using laser ablation, we deposited silicon layers consisting of clusters and crystalline domains onto glass, quartz, aluminum, titanium, copper, single-crystal silicon and single-crystal potassium bromide substrates. The microstructure and the morphology of the films were characterized by use of optical microscopy, laser scanning microscopy, atomic force microscopy, transmission electron microscopy, micro-Raman spectroscopy, X-ray photoelectron spectroscopy and X-ray diffraction. The results indicated that the deposited material was composed of microcrystalline droplets, typically 3.5 μm in diameter, separated by amorphous-like regions. The droplets were composed of crystalline material at their centers and an outer halo of nanometer-size particles. © 1999 Elsevier Science S.A. All rights reserved.