Abstract
The combination of nonvolatile memory switching and volatile threshold switching functions of transition metal oxides in crossbar memory arrays is of great potential for replacing charge-based flash memory in very-large-scale integration. Here, we show that the resistive switching material structure, (amorphous TiO x)/(Ag nanoparticles)/(polycrystalline TiO x), fabricated on the textured-FTO substrate with ITO as the top electrode exhibits both the memory switching and threshold switching functions. When the device is used for resistive switching, it is forming-free for resistive memory applications with low operation voltage (
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CITATION STYLE
Huang, Y. J., Chao, S. C., Lien, D. H., Wen, C. Y., He, J. H., & Lee, S. C. (2016). Dual-functional memory and threshold resistive switching based on the push-pull mechanism of oxygen ions. Scientific Reports, 6. https://doi.org/10.1038/srep23945
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