Very-high-aspect-ratio micro metal structures of non-straight patterns

Abstract

A fabrication of a periodic array of very-high-aspect-ratio (VHAR) freestanding micro metal structures of regular (non-straight) patterns is presented. By combining a recently reported surfactant-added TMAH process, which creates the sharp pits in non-straight line patterns on a silicon surface, with a recently developed high-yield fabrication of VHAR micro metal structures, which was enabled by the vacuum-assisted electroplating into the electrochemically etched VHAR silicon mold, a new family of metal structures, e.g., VHAR plates in a zigzag and a spiral-like pattern with an aspect ratio and height up to 60:1 and 250 µm, respectively, have been demonstrated for the first time.