UV-curable resins appropriate for UV nanoimprint

Abstract

Three types of UV-curable resins; radical curing type, cationic curing type, and hybrid curing type, a combination of radical and cationic curing type, have been developed for UV nanoimprint. Nanoimprint has a variety range of ways and finds extensive range of applications. For UV nanoimprint UV-curable resins play an important roll for the progress of the nanoimprint technology, but the material used for the study of UV nanoimprint has been so far limited to the radical curing type like acrylic resins. The cationic curing type consisting of epoxides, oxetanes, and vinyl ethers has been studied along with the radical curing type and the hybrid curing type, and has shown usefulness for UV-nanoimprint in reactivity of sub micron thin films. Also the condition for successful pattern transfer has been studied and it turned out that for thin films below 300nm no lower than 5MPas of imprint pressure is necessary. The demolding and the contact to substrate, another important concern for nanoimprint was studied from the view point of additives and some additives having potential for improving the contact to substrate and the demolding have been found. © 2008 CPST.