Kinetics and mechanistic studies of photochemical and oxidative stability of galaxolide

Abstract

Studies on kinetics of galaxolide (HHCB) degradation under influence of UV, simulated sunlight and some advanced oxidation processes (H2O2, UV/H2O2, and Vis/H2O2 ) were conducted. Galaxolide appeared to be a photolabile compound. The first-order kinetics model was assumed for all studied processes. It was observed that basic pH favored HHCB degradation. The influence of natural matrices (river water and artificial sweat) on direct photolysis of HHCB was examined. It was stated that the process of the photodegradation proceeded slower at the presence of each matrix. HHCB lactone was identified using the GC-MS technique. The recorded chromatograms showed that apart from the lactone, other degradation products were formed that we could not identify. In order to deeper understand the HHCB degradation process, DFT calculations were performed. The results pointed out that OH radicals play a key role in HHCB decomposition, which mainly proceeds via H abstractions as well as OH additions. It follows from the calculations that the visible light is sufficient to initiate the advanced oxidation processes (AOPs ) under the oxidative conditions, whereas UV irradiation is needed to start decay with no oxidative agents.