Innovative and tailor-made resist and working stamp materials for advancing NIL-based production technology

Abstract

As a new manufacturing technique based on replication of surface topographies, nanoimprint lithography makes specific demands on materials used as resists for pattern transfer, as molds during replication or as functional materials for permanent application. Thus, highly specialized polymer solutions play a key role for the innovations in nanoimprint-related production technology where a high-throughput and low-cost nanolithography step is performed. In this contribution, recent material innovations at micro resist technology GmbH are reviewed with focus on OrmoStamp® as versatile working stamp material with superior mold properties and its unique applicability to various nanoimprint processes. It is shown by the example of multidimensional nanofluidic devices how tailor-made materials facilitate mass production of innovative applications using nanoimprint lithography. © 2013SPST.