Oxygen inhibition of photopolymerization processes and methods of its suppression

Abstract

In this review the mechanism and kinetics of radical photopolymerization of unsaturated monomers carried out in the presence of atmospheric oxygen have been described. The factors influencing the oxygen inhibition value and basic methods of its suppression such as among others the use of inert gas screen, protective coatings, barriers made of transparent films or paraffin waxes, and use of high intensity light, were presented. Photopolymerization of unsaturated monomers showing decreased sensitivity to oxygen inhibition has been discussed. The mechanism of photopolymerization of the systems containing polar monomers or monomers able to form hydrogen bonds was presented as well as the dependence of polymerization rate on the monomer structure (Table 2). Basic methods of measuring of the oxygen inhibition value have also been described.